RF Match Networks
Obtain Fast, Accurate, and Reliable Matching
Enable fast, accurate, and reliable matching. Advanced Energy’s match networks expertly perform in multiple power ranges.
Available in plug-and-play models or configurable units, easily install, expedite tuning, and tighten process control.
Navigator II
Rapid, Accurate, and Reliable Digitally-Tuned Matching
The Navigator® ll is equipped with microprocessor-controlled, stepper-motor drives, and advanced tuning algorithms — enabling optimized RF power.
An optional internal Z’Scan® II RF sensor provides real-time analysis of process power and impedance — allowing you to quickly identify and significantly reduce process variability.
Optional Virtual Front Panel software is available for monitoring and control through a user’s computer.
DESCRIPTION
The Navigator ll matching network’s advanced digital technology speeds tuning and match response time.
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Leading RF plasma methodology and control
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Advanced pulsing control with tune-while-pulsing capability
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Unprecedented insights into plasma with the integrated Z’Scan II
BENEFITS
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Speedily tune and improve match response time
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Tighten process control
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Increase tool throughput and product yield
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Improve reliability and cost of ownership
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Customize across a variety of chambers and processes
FEATURES
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Digital architecture with model-based rapid tuning algorithms
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Pulsed RF power delivery
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Sweep frequency operation
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Intermodulation distortion (IMD) immunity for multi-frequency applications
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Real-time process power and impedance measurement
APPLICATIONS
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Etch
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Flat Panel Displays
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Semiconductor Manufacturing
Navigator II FCi
Agile, Precise Power Delivery for Demanding High-Speed Matching Applications
The Navigator® II FCi is a standalone, microprocessor-controlled impedance matching network. Incorporating tuning elements adjusted by discrete solid-state switched capacitor arrays, the matching network is driven by the need to achieve fast, accurate tuning across wider impedances. With a similar form, footprint, and tuning ranges as traditional counterparts, these matches offer tuning times in the millisecond range compared with the one-second range typical of traditional matching networks.
This high-speed matching technology is optimized and suited for critical, power sensitive, short duration plasma process steps such as Atomic Layer Etch (ALE).
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When configured for full-range tuning, the Navigator FCi can cover an impedance space identical to that of a vacuum capacitor match. The compactness of solid-state circuitry allows the match to fit within a similar footprint of the conventional version.
This match has no moving mechanical parts, eliminating wear and drift mechanisms inherent to traditional matches. This enables higher reliability and repeatability on a broad range of challenging and continually varying plasma processes.
DESCRIPTION
Advanced Energy's Navigator II FCi enables improved process control with precise power delivery and tuning.
The high-speed matching network is optimized for critical, power sensitive, short duration plasma process steps. Conventional longer steps and wide tuning range, traditionally handled by vacuum capacitor-based matching networks, are also supported.
Through high-speed tuning, the Navigator II FCi offers many process control enhancements.
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Reduced plasma stabilization time
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No plasma dropout between process recipe transitions
BENEFITS
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Achieve fast, accurate tuning across a wide impedance range
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Improve reliability and repeatability
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Reduce power delivery interruption and “winking-out” of plasma
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Utilize technology for short process steps, such as ALE applications
FEATURES
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13.56 MHz
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CW and pulse operation
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Output measurement sensor
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Air cooled
APPLICATIONS
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Semiconductor Manufacturing
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Etch
Navio
Economical, Digital, Configurable Matching Network Solution
Experience simplicity and high reliability in a single, affordable package. The Navio™ matching network leverages our power expertise to precisely match complex plasma impedance to your tuning range. It’s quick, accurate, and repeatable.
Available in multiple power ranges and frequencies, choose from a standard offering or a configurable design. Installation is virtually plug-and-play with Advanced Energy’s RF power supplies.
Virtual Front Panel software is available for monitoring.
DESCRIPTION
The Navio matching network delivers quick, accurate, and repeatable impedance across many applications.
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Plug-and-play installation with Advanced Energy’s RF power supplies for thin film applications
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Efficient and stable power delivery
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Compact and air-cooled (standard package or slim version)
BENEFITS
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Improve throughput, increase yield, and reduce production costs
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Choose a standard model or configure a unit that meets your system requirements
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Install and operate with ease
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Obtain excellent repeatability for high process yield
APPLICATIONS
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Deposition
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Etch
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Flat Panel Display
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Glass Coating
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Industrial Coatings
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Semiconductor Manufacturing
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Solar Photovoltaics