grs-plasma-rotatable magnetrons
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GENCOA - ROTATABLE MAGNETRONS

Gencoa has a range of rotatable magnetrons, with each product providing unique benefits for the intended application. All deliver high performance and reliability, enhanced by utilizing Gencoa's magnetic arrays supported by magnetic modelling and also available with Gencoa's patented dual, low impedance magnetics where applicable.

Industry-leading high performance planar magnetrons

Gencoa planar rectangular magnetrons combine low ownership cost, robust design and highly-optimized magnetics to produce a reliable product delivering high performance.

Gencoa have a well-established track record of providing critical components and technology for coating flexible substrates, architectural glass, solar cells, displays, touch screens and semiconductor wafers. Careful attention is given to ensuring a long-life, trouble-free operation and excellent target use. The integrated gas delivery system acts as a powerful mechanism for tuning deposition uniformity by employing single or multi-zone control. All cathodes are fitted with a diaphragm type cooling for high power operation without breaking a water seal during target changeover. Direct cooling is achievable with removal of the diaphragm. Gencoa sources are configured with various power options such as DC, pulsed-DC, RF (up to 30kW) and HiPIMS. A unique design incorporating zero-height anodes prevent short circuits during processes and reduce dust and defects in the coatings. All sources incorporate flange plate cooling as standard. Depending on the application, Gencoa can configure individual cathodes to meet specific process requirements and limitations. An OEM proprietary magnetron design and manufacture service is also offered.

 
GRS S rotatable magnetrons
GRS C rotatable magnetrons

GRS-S

The GRS-S product is the most compact ‘drop-in’ rotatable magnetron design available on the market. The small size is a result of the Gencoa patented rotational drive system that minimizes the space required for the end-block assembly.

ADVANTAGES

  • Reduces target material and end-block costs

  • Unique patented system provides a compact and reliable end block design

  • High water flow (40 l/min)

  • Compact width allows a GRS dual to replace a standard Gencoa external 125mm target width planar magnetron

  • Utilises Gencoa’s high performance magnetics including balanced, unbalanced, high strength and DLIM options

  • Can incorporate an active anode in dual configuration

  • Unique seal design for reliable operation sets it apart from other competitors

  • High uniformity in a confined space (65mm from outer edge of endblock to race-track)

  • Can be used in conjunction with Gencoa gas bars, active anode, Optix and Speedflo

GRS-C

GRS-C is a cantilever-mounted rotatable magnetron by Gencoa which combines high load bearing and power delivery. The GRS-C is for horizontal drum type web coating machines with the end-block located outside the chamber side wall, and the target rotating within the chamber.

ADVANTAGES

  • Can be fitted with non-proprietary targets

  • Double seals for target mounting and double screws target clamping

  • High water flow

  • Market leading vacuum integrity of vacuum seals – better than 5x10-8 mbar l/s He leak rate under rotation

  • Leak check port for vacuum seals and rotary encoder for drive monitoring

  • Easy to maintain

  • Utilises Gencoa’s high performance magnetics including balanced, unbalanced, high strength and DLIM options

  • Low deflection magnet bar support tubes

  • Unique seal design for reliable operation sets it apart from other competitors

  • High current capacity

  • Can be used in conjunction with Gencoa gas bars, active anode, Optix and Speedflo

  • Array angle positioning can be performed in-situ without breaking water seals or any disassembly – manual or motor driven

GRS-V rotatable magnetrons
grs-m rotatable magnetrons

GRS-V

GRS-V is a vertically-mounted rotatable magnetron by Gencoa, a recent addition to the Gencoa Rotatable System product range. The GRS-V features high power capacity and water flow, excellent end-block vacuum integrity and has a water drain feature for easy target change within the chamber.

ADVANTAGES

  • Can use varying target diameters

  • Double seals for target mounting and double screws target clamping

  • Quick release magnet bar for in-chamber target changing

  • Variable target to chamber plate distances (please specify on order)

  • High water flow and power delivery

  • Market leading integrity of vacuum seals – better than 5x10-8 mbar l/s He leak rate under rotation and > 3 year dynamic seal life guarantee

  • Easy to maintain

  • Can be used in conjunction with Gencoa gas bars, Active Anode, Optix and Speedflo

  • Array angle positioning for pre-cleaning targets in the reverse direction

  • No out-bound support required for vertical down orientation

  • Utilises Gencoa's high performance magnetics designed for different production needs:

  • XPP extremely unbalanced for reactive ion assisted deposition (hard coating)

  • PP unbalanced magnetics for decorative coating of plastics

  • HS high strength for ITO, magnetic targets and high power metallizing

  • DLIMAA, double low impedance magnetics with Active Anode for higher density, lower stress layers

GRS-M

The GRS-M product is a high capacity 'drop-in' rotatable magnetron for target diameters of 152mm and above, and target lengths of up to 2m, in a vertical or horizontal orientation.

ADVANTAGES

  • Double seals for target mounting and double screws target fixing

  • Unique patented drive system provides a compact and high capacity end block design

  • High water flow (60 l/min)

  • Market leading integrity of vacuum seals – better than 5x10-8 mbar l/s He leak rate under rotation

  • Utilises Gencoa’s high performance magnetics including balanced, unbalanced, high strength and DLIM options

  • Low deflection magnet bar support tubes

  • Can incorporate an active anode in dual configuration for higher density, low defect and low stress layers

  • Unique seal design for reliable operation sets it apart from other competitors

  • High uniformity in a confined space, 107mm from outer edge of endblock to race-track

  • Can be used in conjunction with Gencoa gas bars, active anode, Optix and Speedflo

active anode

ACTIVE ANODE

Gencoa have pioneered and patented the use of magnetic guidance of electrons between rotatable magnetrons and auxiliary anodes to improve process performance. Like any electrical circuit, a plasma requires a means of returning the electron current to an anode to maintain stability and uniformity.

Planar magnetrons have the surrounding dark space shield to collect the plasma electrons. A rotatable magnetron does not use a dark space shield which has lead Gencoa to develop the method to magnetically guide electrons to an effective anode – so called Active Anodes. The Active Anodes are connected to earth and use the magnetic trapping and gas injection to both guide the electrons and for gas activation.

ADVANTAGES

  • Lower temperature deposition – 100% of plasma electrons collected by AA in DC discharges for 25% lower substrate heating

  • AA in switching square wave dual cathode arrangements results in 30% heat reduction compared to AC power mode with AA

  • Better uniformity – the electrons have a linear uniform earth return with no drift during target life

  • Lower defects – the active anode reduces arcs and hence defects as a result of better plasma stability

  • Higher film density – the AA produces enhanced ion bombardment of the substrate for denser films

  • Harder films – eg AA doubles the hardness of sputtered carbon coatings on glass to 25 Gpa

  • Lower stress – films deposited with the AA and pulsed or AC power modes present much reduced internal stress and the substrate bombardment cycles between positive and negative

  • Low resistivity ITO layers as a result of the lower damage plasma – reduction of sputter voltage when anode is biased positively

AC reactive processes with Active Anodes

The AA is generally connected to the positive of the DC type power supply, or connected to earth when using switching AC type power mode. In the case of applying a positive voltage to the anode, the cathode voltage of the target can be shifted down in the same proportion as the anode voltage. This allows up to 80 volt reduction of target discharge. This is ideal for low voltage sputtering of ITO from a rotatable target. An example is shown in the video below.

AC reactive processes with Active Anodes

The use of AC power between two rotatable magnetrons is common for the high rate deposition of reactive oxide layers and other dielectric material. The addition of an earthed active anode between the two targets improves the stability of the process and hence reduces defects. Uniformity is improved as the electrons are guided to the anode without immersing the substrate in plasma.

When the film structure is analysed of the standard AC pair of cathodes and that of an anode added, the density of the layer is improved. In addition thicker layers can be deposited as the internal stress of the layer is reduced, improving adhesion to the substrate.

DC & pulsed DC non-reactive processes with Active Anodes

For a DC powered plasma, the active anode provide a long term and uniform collection of electrons that is not disturbed by substrate movement or coating of the chamber walls. Beneficial effects are in the better uniformity both down the target length and over prolonged periods of time. The AA will also reduce the temperature of the deposition as all the electrons are collected in the anode and do not contribute to additional substrate heating.

As an application example, when batch metallizing of plastic parts, outgassing of the plastic can result in a ‘semi-reactive’ type of deposition and cover the anode surface. Additionally, if HMDSO plasma activated deposition is used to seal the coated part, the chamber surfaces will become coated. Passing argon through the active anode will enable long term trouble free operation.

DC & pulsed DC reactive processes with Active Anodes

The use of pulsed DC with a reactive gas can be problematic if the resulting coating is electrically insulating – results in the ‘disappearing anode’ effect as the chamber and all parts become covered in oxide material. The Active Anode prevents this which allows any reactive process to run stably with pulsed DC power as an alternative to AC power operation. Advantages are again in the enhanced uniformity but also the use of single as well as double targets.

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